Company Filing History:
Years Active: 2024
Title: Yi-Shao Lin: Innovator in Chemical-Mechanical Planarization Systems
Introduction
Yi-Shao Lin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of chemical-mechanical planarization (CMP) systems. His innovative work has led to the development of advanced technologies that enhance the efficiency and effectiveness of CMP processes.
Latest Patents
Yi-Shao Lin holds a patent for "Multi-layered windows for use in chemical-mechanical planarization systems." This patent describes multi-layered windows that include a transparent structural layer and a hydrophilic surfactant applied to at least a portion of one surface of the transparent structural layer. These multi-layered windows can be utilized in polishing pads, platens, or both, significantly improving the CMP process.
Career Highlights
Yi-Shao Lin is associated with Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in semiconductor manufacturing. His work has been instrumental in advancing the technology used in the industry.
Collaborations
Some of his notable coworkers include Shih-Chung Chen and Sheng-Tai Peng, who have collaborated with him on various projects within the semiconductor field.
Conclusion
Yi-Shao Lin's contributions to the field of chemical-mechanical planarization systems demonstrate his innovative spirit and commitment to advancing technology. His patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key figure in the semiconductor industry.