Yi-Lung Wang

Title: Inventor Yi-Lung Wang: Innovating Semiconductor Manufacturing in Tai-Chung County

Introduction

Yi-Lung Wang is a notable inventor based in Tai-Chung County, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, with a specific focus on improving the processes involved in layer formation on semiconductor wafers. His innovative approach addresses critical issues faced by the industry, particularly related to metal nitride layers and copper surfaces.

Latest Patents

Wang holds one patent titled "Method of forming a metal nitride layer over exposed copper." This patent describes a method for depositing a plasma enhanced chemical vapor deposition (CVD) metal nitride layer over an exposed copper surface, which is crucial in semiconductor wafer manufacturing. The innovation focuses on enhancing adhesion of the metal nitride layer and minimizing copper hillock formation. The process involves several steps, including preheating the copper surface, plasma sputtering to remove copper oxides, and depositing the metal nitride layer at a selected deposition pressure to control plasma ion bombardment energy transfer.

Career Highlights

Yi-Lung Wang is currently associated with Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work is essential in maintaining and advancing the quality of semiconductor products. Wang's ingenuity and technical expertise have positioned him as a valuable asset within the company, contributing to its reputation for innovation and excellence.

Collaborations

Wang collaborates with talented colleagues Yi-Lung Cheng and Wen-Kung Cheng, enhancing the richness of ideas and developments at Taiwan Semiconductor Manufacturing Company Ltd. These collaborative efforts not only foster a creative environment but also lead to advancements in semiconductor technologies that can have far-reaching impacts across various applications.

Conclusion

Yi-Lung Wang's contributions to semiconductor manufacturing exemplify the importance of innovation in technology. Through his patented methods for forming metal nitride layers, he has addressed significant challenges in the industry. As he continues to work alongside esteemed colleagues, Wang's efforts will undoubtedly lead to further advancements, solidifying his position as an impactful inventor in the field.