Company Filing History:
Years Active: 2016-2018
Title: Yi-Hui Lin: Innovator in Semiconductor Technology
Introduction
Yi-Hui Lin is a prominent inventor based in Changhua County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative methods have advanced the development of semiconductor structures and devices.
Latest Patents
Yi-Hui Lin's latest patents include a method for forming a semiconductor structure. This method involves providing a preliminary structure that includes a substrate and a plurality of fins formed on the substrate. A first polysilicon layer is then formed on the substrate, covering at least portions of the fins. Additionally, an amorphous silicon layer is formed on the first polysilicon layer. Another notable patent is for a method for filling gaps in semiconductor devices. This method provides a silicon substrate with protruding portions spaced apart by gaps. A nitride-containing layer is formed above the silicon substrate, covering the protruding portions and surfaces of the gaps. An insulating layer is then formed on the amorphous silicon layer, filling the gaps.
Career Highlights
Yi-Hui Lin is currently employed at United Microelectronics Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in enhancing the efficiency and performance of semiconductor devices.
Collaborations
Some of Yi-Hui Lin's coworkers include Yu-Ren Wang and Keng-Jen Lin, who contribute to the collaborative efforts in their projects.
Conclusion
Yi-Hui Lin's contributions to semiconductor technology through his patents and work at United Microelectronics Corporation highlight his role as a key innovator in the field. His methods for forming semiconductor structures and filling gaps in devices are paving the way for advancements in technology.