Location History:
- Longtan Township, Taoyuan County, TW (2008)
- Taoyuan County, TW (2014 - 2015)
- Tao-Yuan, TW (2016 - 2018)
Company Filing History:
4 out of 220 
2 out of 55 Years Active: 2008-2018
Title: Yi-Hsiuan Yu: Innovator in Semiconductor Technology
Introduction
Yi-Hsiuan Yu is a prominent inventor based in Tao-Yuan, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 6 patents. His work focuses on enhancing the efficiency and effectiveness of semiconductor processes through innovative designs and methods.
Latest Patents
One of his latest patents is the "Aluminum nitride electrostatic chuck used in high temperature and high plasma power density semiconductor manufacturing process." This invention features an aluminum nitride electrostatic chuck that includes a positioning electrostatic chuck and a carrier structure. The design incorporates a groove structure layer, a dielectric insulation layer, and a heat conduction layer. The cooling gas channels within the groove structure layer help control the temperature distribution of a wafer, making it particularly suitable for high-temperature and high plasma power density semiconductor manufacturing processes.
Another notable patent is the "Method of forming pattern with high aspect ratio on polycrystalline aluminum nitride substrate." This method involves several steps, including providing an aluminum nitride substrate, forming a barrier layer, and etching the barrier layer with an energy beam. The process allows for the quick and effective preparation of an aluminum nitride substrate with a pattern that has a high aspect ratio.
Career Highlights
Yi-Hsiuan Yu has worked with esteemed organizations such as the National Chung Shan Institute of Science and Technology and the Chung-Shan Institute of Science and Technology, Armaments Bureau, M.N.D. His experience in these institutions has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Throughout his career, Yi-Hsiuan Yu has collaborated with notable colleagues, including Lea-Hwung Leu and Bao-Yann Lin. These collaborations have further enriched his work and expanded the impact of his inventions in the semiconductor field.
Conclusion
Yi-Hsiuan Yu is a distinguished inventor whose contributions to semiconductor technology have paved the way for advancements in manufacturing processes. His innovative patents and career achievements reflect his dedication to enhancing the efficiency of semiconductor applications.