This inventor holds 1 USPTO granted patent. Top assignee: Mosel Vitelic Corporation. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: Yi-Fu Chang: Innovator in Multilayer Structure Fabrication
Introduction
Yi-Fu Chang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of integrated circuit (IC) manufacturing. His innovative approach to fabricating oxide/nitride multilayer structures has garnered attention in the industry.
Latest Patents
Yi-Fu Chang holds a patent for a "Method of fabricating an oxide/nitride multilayer structure for IC manufacture." This patent describes a method that allows for the creation of a multilayer structure of dielectric films. These films can be utilized in the manufacturing of E PROM, flash memories, or the dielectric layers of a DRAM capacitor. The unique aspect of this invention is that all films are formed in the same chamber, requiring only one heating and one cooling step to create an oxide/nitride/oxide structure or an oxide/nitride/oxide/nitride structure.
Career Highlights
Yi-Fu Chang is associated with Mosel Vitelic Corporation, where he has been instrumental in advancing technologies related to semiconductor manufacturing. His work has contributed to the efficiency and effectiveness of IC production processes.
Collaborations
Some of his notable coworkers include Yi-Shin Chang and Ming-Kuan Kao. Their collaborative efforts have further enhanced the innovative environment at Mosel Vitelic Corporation.
Conclusion
Yi-Fu Chang's contributions to the field of IC manufacturing through his patented methods highlight his role as a key innovator. His work continues to influence advancements in semiconductor technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile