Taoyuan, Taiwan

Yi-Fang Hsieh

This inventor holds 1 USPTO granted patent. Top assignee: Advanced Echem Materials Company Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yi-Fang Hsieh. Retrieved from https://idiyas.com/inventor/yi-fang-hsieh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yi-Fang Hsieh: Inventor in Resin Materials

Introduction

Yi-Fang Hsieh is an inventor based in Taoyuan, Taiwan. His work includes a patent concerning resin compositions and cured films. He is associated with Advanced Echem Materials Company Limited.

Latest Patents

Hsieh is credited with 1 patent, titled “Resin Composition and Cured Film.” The patent describes a resin composition containing a resin, crosslinking agent, surfactant, additive, and solvent. The resin may include a phenol-based resin or a hydroxyl-containing polystyrene resin. The additive may include a fluoro-based phenol, a polyhydroxyphenol resin, an epoxy-containing compound, a polyether resin, a thermal acid generator containing a sulfonate ion, or a combination of these materials. The composition and resulting cured film are the focus of the invention.

Career Highlights

Hsieh’s listed patent reflects work on resin formulations and cured-film materials. His association with Advanced Echem Materials Company Limited connects his inventive activity with the company’s materials-related work.

Collaborations

Yu-Ning Chen and Shao-Li Ho are identified as Hsieh’s coworkers. The provided information does not specify their roles in the patent or whether they collaborated on this invention.

Conclusion

Yi-Fang Hsieh’s patent focuses on a resin composition and cured film, highlighting his contribution to materials innovation in Taiwan.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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