The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2026

Filed:

Jul. 06, 2023
Applicant:

Advanced Echem Materials Company Limited, Taoyuan, TW;

Inventors:

Yi-Fang Hsieh, Taoyuan, TW;

Yu-Ning Chen, Taoyuan, TW;

Shao-Li Ho, Taoyuan, TW;

Hui-Ju Chen, Taoyuan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 29/02 (2006.01); C08K 5/06 (2006.01); C08K 5/136 (2006.01); C08K 5/42 (2006.01);
U.S. Cl.
CPC ...
C08L 29/02 (2013.01); C08K 5/06 (2013.01); C08K 5/136 (2013.01); C08K 5/42 (2013.01); C08L 2203/16 (2013.01); C08L 2205/03 (2013.01);
Abstract

A resin composition and a cured film are provided. The resin composition includes a resin (A), a crosslinking agent (B), a surfactant (C), an additive (D) and a solvent (E). The resin (A) includes at least one of a phenol-based resin (A-1) and a polystyrene resin including a hydroxyl group (A-2). The additive (D) includes a fluoro-based phenol (D-1), a polyhydroxyphenol resin (D-2), a compound including an epoxy group (D-3), a polyether resin (D-4), a thermal acid generator including a sulfonate ion (D-5), or a combination thereof.


Find Patent Forward Citations

Hsieh, Yi-Fang. (2026). Resin composition and cured film (U.S. Patent No. 12747344). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12747344

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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