Yi-Chuan Yang

Title: Yi-Chuan Yang: Innovator in Semiconductor Technology

Introduction

Yi-Chuan Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for forming bottom oxide layers in trench structures. With a total of 5 patents to his name, Yang's work has had a substantial impact on the industry.

Latest Patents

One of Yi-Chuan Yang's latest patents is titled "Method of forming bottom oxide layer in trench structure." This invention outlines a process that includes providing a semiconductor substrate and forming a trench structure within it. The method employs a PECVD process using TEOS as a source to deposit an oxide layer on the bottom and sidewalls of the trench structure. The process also involves the removal of the oxide layer on the sidewalls and partial removal on the bottom to define the remaining oxide layer as the bottom oxide layer.

Another notable patent is "Bottom oxide formation process for preventing formation of voids in trench." This invention focuses on forming a bottom oxide layer in trench structures used in semiconductor devices, such as Double-Diffused Metal-Oxide Semiconductor (DMOS) devices. The method includes forming a silicon nitride layer on the semiconductor substrate, followed by the creation of a trench structure and the deposition of oxide layers. The process ensures the effective removal of oxide layers to achieve the desired trench structure.

Career Highlights

Yi-Chuan Yang is currently employed at Mosel Vitelic Corporation, where he continues to innovate in semiconductor technology. His expertise in the field has led to advancements that enhance the performance and reliability of semiconductor devices.

Collaborations

Yang has collaborated with notable coworkers, including Shih-Chi Lai and Yen-Jung Chang. Their combined efforts contribute to the ongoing development of cutting-edge technologies in the semiconductor industry.

Conclusion

Yi-Chuan Yang's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key inventor in the field. His work continues to influence advancements in semiconductor manufacturing processes.