Location History:
- Danshu, TW (2013)
- Dansheui, TW (2017)
Company Filing History:
Years Active: 2013-2017
Title: Innovations by Yi Chia Lee: Pioneering Solutions for Microelectronic Device Cleaning
Introduction: Yi Chia Lee, an inventor based in Dansheui, Taiwan, has made significant contributions to the field of microelectronics through his innovative cleaning formulations. With two patents to his name, he demonstrates a commitment to addressing critical challenges in the maintenance and performance of microelectronic devices.
Latest Patents: Yi Chia Lee's latest patents showcase his expertise in formulating effective cleaning solutions. The first patent involves a composition and method for removing copper-containing post-etch and/or post-ash residue from patterned microelectronic devices. This composition includes water, a water-miscible organic solvent, amine compounds, organic acids, and fluoride ion sources, effectively eliminating residues without damaging sensitive materials such as low-k dielectrics and metal interconnects.
His second patent introduces a photoresist stripper formulation designed for the removal of dry films. This innovative solution comprises Hydroxylamine, water, a range of solvents including dimethylsulfoxide and N-methylpyrrrolidine, selected bases like choline hydroxide and monoethanolamine, metal corrosion inhibitors such as catechol and gallic acid, as well as bath life extending agents like glycerine. This formulation, along with a method for its application, underscores Yi Chia Lee's ability to engineer sophisticated solutions for complex challenges in microelectronics.
Career Highlights: Yi Chia Lee has been notably identified with Air Products and Chemicals, Inc., a company recognized for providing essential industrial gases and chemicals. His work within the organization not only advances the technical capabilities of microelectronic cleaning processes but also aligns with the company's innovative approach to chemical development.
Collaborations: Throughout his career, Yi Chia Lee has collaborated with notable colleagues such as Wen Dar Liu and Madhukar Bhaskara Rao. These collaborations are indicative of a productive environment fostering innovation and the continuous improvement of cleaning formulations for the microelectronics sector.
Conclusion: Yi Chia Lee stands out in the realm of invention with his thoughtful approach to solving industry-specific challenges. His patents reflect a deep understanding of the needs in microelectronics cleaning, showcasing his commitment to innovation while working at Air Products and Chemicals, Inc. Through his continued contributions, he paves the way for advancements that will benefit the wider microelectronics community.