Yi-Chen Su

Title: Yi-Chen Su: Innovator in Semiconductor Lithography

Introduction

Yi-Chen Su is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in enhancing lithography operations. With a total of 4 patents to his name, Su's work is pivotal in advancing technology in this critical industry.

Latest Patents

One of Yi-Chen Su's latest patents focuses on enhancing lithography operations for manufacturing semiconductor devices. This innovative method involves treating the surface of a reticle by retrieving it from a reticle library and transferring it to a treatment device. The reticle's surface is treated by irradiating it with UV radiation while ozone fluid is applied for a predetermined irradiation time. After treatment, the reticle is transferred to an exposure device to generate a photo resist pattern on a wafer. The surface of the wafer is then imaged to create an image of the photo resist pattern. This image is analyzed to determine the critical dimension uniformity (CDU) of the pattern. If the CDU does not meet a specified threshold, the predetermined irradiation time is increased to ensure quality.

Career Highlights

Yi-Chen Su is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His expertise in lithography and surface treatment has positioned him as a key player in the development of advanced manufacturing techniques.

Collaborations

Su collaborates with talented colleagues, including Tzu-Yi Wang and Ta-Cheng Lien, who contribute to his innovative projects and research efforts.

Conclusion

Yi-Chen Su's work in semiconductor lithography exemplifies the importance of innovation in technology. His patents and contributions continue to shape the future of semiconductor manufacturing.