Company Filing History:
Years Active: 2009
Title: Profile of Inventor Yi-An Jian
Introduction: Yi-An Jian is a skilled inventor based in Banchiau, Taiwan, known for his significant contribution to the field of wafer cleaning technology. With a focus on developing innovative methods, he has made strides in enhancing the semiconductor manufacturing process.
Latest Patents: Yi-An Jian holds one notable patent titled "Methods of Spin-On Wafer Cleaning." This invention delineates a method for effectively cleaning wafers using a spin-on technique. The process involves controlling both spin speed and vertical water jet pressure, ensuring that these two parameters are maintained in inverse proportion. Specifically, the wafer spin speed ranges from 50 to 1200 rpm, while the vertical wafer jet pressure varies between 0.05 to 100 KPa. This innovative approach aims to improve the cleanliness of wafers, which is essential for high-quality semiconductor production.
Career Highlights: Yi-An Jian is associated with the Taiwan Semiconductor Manufacturing Company Limited, a leading firm in semiconductor manufacturing. His work in this capacity has allowed him to apply his inventive skills in a practical environment, contributing to advancements in wafer cleaning technologies and enhancing overall production efficiency.
Collaborations: Throughout his career, Yi-An Jian has collaborated with notable colleagues, including Jun Wu and Dong-Xuan Lu. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas, further enhancing the technological landscape of semiconductor manufacturing.
Conclusion: Yi-An Jian stands out as a prominent figure in the realm of semiconductor innovations, particularly with his patent for spin-on wafer cleaning methods. His work at the Taiwan Semiconductor Manufacturing Company Limited and collaborations with esteemed colleagues underscore his commitment to advancing technology in the semiconductor industry. With his inventive spirit and dedication, Yi-An Jian continues to impact the field of wafer cleaning and semiconductor production.