Suwon, South Korea

Yeongchan Cho

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yeongchan Cho. Retrieved from https://idiyas.com/inventor/yeongchan-cho

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yeongchan Cho and EUV Illumination System Innovation.

Introduction

Yeongchan Cho is an inventor based in Suwon, South Korea, whose patent work concerns extreme ultraviolet (EUV) lithography. His listed invention focuses on configuring an illumination system to improve EUV exposure.

Latest Patents

Cho is associated with 1 patent, titled “Method of Configuring Extreme Ultra-Violet (EUV) Illumination System, and EUV Exposure Method Using the EUV Illumination System.” The invention describes calculating aerial images through optical simulations of EUV point sources, combining those images according to EUV mapping, and evaluating source combinations with a fitness value. The system is configured using the combination that achieves the maximum fitness value. The method also describes using the resulting illumination system for EUV exposure.

Career Highlights

Cho’s listed patent is associated with Samsung Electronics Ltd. It addresses the optimization of EUV illumination, a technology used in semiconductor manufacturing.

Collaborations

The provided information names Minjae Kim and Sungmin Nam as Cho’s coworkers. Their specific roles in the patent or related work are not specified.

Conclusion

Yeongchan Cho’s recorded invention applies optical simulation and fitness-based selection to configure an EUV illumination system, connecting his patent work with semiconductor exposure technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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