The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Aug. 16, 2024
Samsung Electronics Co., Ltd., Suwon-si, KR;
Yeongchan Cho, Suwon-si, KR;
Minjae Kim, Suwon-si, KR;
Sungmin Nam, Suwon-si, KR;
Seunghune Yang, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
Provided are a method of configuring an optimized extreme ultraviolet (EUV) illumination system, and an EUV exposure method using the EUV illumination system. The method of configuring the EUV illumination system includes calculating an aerial image by performing an optical simulation with respect to each of EUV point sources, summing up the aerial images based on EUV mapping, searching for a combination of the EUV point sources by using a fitness value with respect to the summed aerial image, and configuring the EUV illumination system as a combination of the EUV point sources, which has a maximum fitness value.