San Diego, CA, United States of America

Yeon Ui Lee

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: University of California. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yeon Ui Lee. Retrieved from https://idiyas.com/inventor/yeon-ui-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yeon Ui Lee and High-Resolution Illumination Nanoscopy

Introduction

Yeon Ui Lee is an inventor based in San Diego, California, and is associated with the University of California. His work includes an invention designed to advance ultra-high-resolution illumination nanoscopy.

Latest Patents

Lee is named on 1 patent, titled “High Effective Refractive Index Materials for Ultra-High Resolution Illumination Nanoscopy.” The invention describes a structure made with one or more high effective refractive index materials on a substrate. When illuminated, the structure can generate sub-diffraction-limit patterns, including speckle patterns, to illuminate a specimen during image capture. The materials may have an effective refractive index of 3 or greater, with examples including hyperbolic metamaterial multilayers, nanowire-based hyperbolic metamaterials, and organic hyperbolic materials.

Career Highlights

The patent reflects Lee’s contribution to research in optical materials and advanced microscopy. By using engineered materials to create illumination patterns beyond the diffraction limit, the technology aims to support imaging of fine specimen details.

Collaborations

Lee’s listed coworkers include Zhaowei Liu and Qian Ma. The patent’s institutional association is the University of California.

Conclusion

Yeon Ui Lee’s patent explores how high effective refractive index materials can enable sub-diffraction-limit illumination, contributing to the development of ultra-high-resolution nanoscopy.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…