Yeon Kheng Lim

Title: Innovator Spotlight: Yeon Kheng Lim

Introduction: Yeon Kheng Lim is a notable inventor based in Singapore, SG, recognized for his significant contributions to semiconductor technology. With a keen focus on enhancing semiconductor devices, Yeon has garnered attention for his innovative approach in his patented invention.

Latest Patents: Yeon's most notable patent is titled "Structure and method of liner air gap formation." This patent describes a sophisticated structure and method for creating a semiconductor device that incorporates liner air gaps alongside interconnects and dielectric layers. The process involves forming a dielectric layer over a lower dielectric layer and a lower interconnect situated on a substrate. A key part of the innovation includes creating an interconnect opening within this dielectric layer, which features sidewalls made from the dielectric material. By forming a sacrificial liner over these sidewalls and subsequently placing an upper interconnect that fills this opening, Yeon's invention effectively facilitates the removal of the sacrificial liner/spacers, resulting in the formation of air liner gaps. This advancement promises to enhance the performance and efficiency of semiconductor devices.

Career Highlights: Yeon Kheng Lim is currently employed at Chartered Semiconductor Manufacturing Ltd, a corporation known for its advanced semiconductor manufacturing processes. His work contributes to the company's reputation as a leader in the semiconductor industry. With one patent to his name, Yeon has firmly established himself as an influential player in his field.

Collaborations: Throughout his career, Yeon has collaborated with esteemed colleagues, including Xiaomei Bu and Alex See. These collaborations not only enhance the creative synergy within the team but also contribute to the development of groundbreaking technologies in the semiconductor sector.

Conclusion: Yeon Kheng Lim exemplifies the spirit of innovation in the semiconductor industry. His patent on the structure and method of liner air gap formation showcases his commitment to advancing technology, and his collaboration with other skilled professionals further amplifies his impact. As the semiconductor landscape continues to evolve, inventors like Yeon are at the forefront, driving the next wave of technological advancements.