Suwon-si, South Korea

Yeon Hee Seong

This inventor holds 1 USPTO granted patent. Top assignees: Dct Material LLC, Samsung Electronics Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yeon Hee Seong. Retrieved from https://idiyas.com/inventor/yeon-hee-seong-er62alh6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yeon Hee Seong: Innovator in Semiconductor Technology

Introduction

Yeon Hee Seong is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly through his innovative work in photoresist compositions.

Latest Patents

Yeon Hee Seong holds a patent for a semiconductor photoresist composition and a method of forming patterns using this composition. The patent describes a semiconductor photoresist composition that includes an organometallic compound represented by Chemical Formula 1 and a solvent. This invention is crucial for the advancement of semiconductor manufacturing processes.

Career Highlights

Throughout his career, Yeon Hee Seong has worked with prominent companies in the technology sector. He has been associated with Samsung Electronics Ltd., a leader in consumer electronics and technology solutions. Additionally, he has contributed his expertise to DCT Material LLC, a company focused on advanced materials for semiconductor applications.

Collaborations

Yeon Hee Seong has collaborated with various professionals in his field, including Tsunehiro Nishi, enhancing the innovation and development of semiconductor technologies.

Conclusion

Yeon Hee Seong's contributions to semiconductor technology through his patent and career achievements highlight his role as an influential inventor in the industry. His work continues to impact the advancement of semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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