Company Filing History:
Years Active: 2010
Title: Innovations by Yeo-Hwang Kim in Semiconductor Technology.
Introduction
Yeo-Hwang Kim is a notable inventor based in Gwanak-gu, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the measurement of on-resistance in backside drain wafers. His innovative approach has implications for the efficiency and performance of semiconductor devices.
Latest Patents
Yeo-Hwang Kim holds a patent for a method of measuring on-resistance in a backside drain wafer. This method involves providing a wafer that contains a first and a second MOS transistor, each having a source and sharing a drain located at the backside of the wafer. The process includes forming a current flow path that passes through both MOS transistors and measuring the resistance between their sources. This technique allows for the measurement of on-resistance without the need for a chuck, enhancing the efficiency of the measurement process.
Career Highlights
Yeo-Hwang Kim is currently associated with Dongbu Hitek Co., Ltd., where he applies his expertise in semiconductor technology. His work focuses on developing innovative solutions that improve the performance and reliability of semiconductor devices. His contributions have been recognized within the industry, showcasing his commitment to advancing technology.
Collaborations
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Conclusion
Yeo-Hwang Kim's innovative methods in semiconductor technology, particularly his patent on measuring on-resistance in backside drain wafers, highlight his significant role in the field. His work continues to influence advancements in semiconductor efficiency and performance.