Company Filing History:
Years Active: 2025
Title: Yenxia Hao: Innovator in Semiconductor Technology
Introduction
Yenxia Hao is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in enhancing the manufacturing processes of integrated circuits. His innovative approach has led to the development of a unique method that addresses critical challenges in the industry.
Latest Patents
Yenxia Hao holds 1 patent for his invention titled "Method for increasing bridging process window of contact hole and gate of device." This patent presents a method designed to increase the process window, thereby avoiding bridging between a device's contact hole and gate. The method involves placing a semiconductor structure containing a gate structure in a reaction cavity, where various reaction gases are sequentially introduced. This innovative process results in the formation of films on the sidewalls of the gate structure, enhancing the overall performance and reliability of semiconductor devices.
Career Highlights
Yenxia Hao is currently associated with Shanghai Huali Integrated Circuit Corporation, where he applies his expertise in semiconductor manufacturing. His work focuses on improving the efficiency and effectiveness of integrated circuit production, contributing to advancements in the technology sector.
Collaborations
Due to space constraints, the collaborations section has been omitted.
Conclusion
Yenxia Hao's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the development of more efficient manufacturing processes in the industry.