Company Filing History:
Years Active: 2020-2024
Title: **Yen Lin Leow: Innovating Silicon Carbide Coatings in Phoenix, AZ**
Introduction
Yen Lin Leow is an accomplished inventor based in Phoenix, AZ, known for his groundbreaking work in the field of semiconductor materials. With a total of four patents to his name, Leow has made significant advancements in methods for forming silicon carbide coatings, which are crucial for various high-performance applications.
Latest Patents
One of Leow's latest patents focuses on "Methods of forming silicon carbide coated base substrates at multiple temperatures." This innovative approach involves the utilization of silicon-containing precursors introduced into a process chamber at carefully controlled temperatures. Initially, at around 800° C. to just under 1,000° C., a first silicon carbide layer is formed on a base substrate. Following that, a second silicon-containing precursor is introduced at a temperature between 1,000° C. to 1,400° C. to create a second silicon carbide layer atop the first. This patented method aims to enhance the quality and performance of silicon carbide substrates, which are vital in the electronics industry.
Career Highlights
Yen Lin Leow has worked with notable companies in the technology sector, including ASM IP Holding B.V. and Applied Materials, Inc. His tenure at these organizations has enabled him to contribute substantially to the development of advanced materials and coating technologies, solidifying his position as a respected inventor in his field.
Collaborations
Throughout his career, Leow has had the pleasure of collaborating with talented individuals. Noteworthy coworkers include Caleb Koy Miskin and Hyeongeu Kim, who have brought their expertise and insights to various projects alongside him. These collaborations demonstrate the power of teamwork in driving innovation and achieving success in complex technological domains.
Conclusion
Yen Lin Leow's contributions to the field of silicon carbide coatings represent a significant leap in innovation. His cutting-edge patents not only advance technology but also pave the way for new applications in electronics and related industries. As he continues to push the boundaries of what is possible in semiconductor materials, his work serves as an inspiration for future inventors and engineers.