Location History:
- Dong-Gang jen, TW (2005)
- Donggang Township, Pingtung County, TW (2008)
Company Filing History:
Years Active: 2005-2008
Title: Yen-Fei Lin: Innovator in Semiconductor Technology
Introduction
Yen-Fei Lin is a notable inventor based in Donggang, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for enhancing polysilicon grain size and stabilizing titanium nitride layers.
Latest Patents
Yen-Fei Lin holds two patents that showcase his innovative approaches. The first patent is a method for increasing polysilicon grain size. This invention involves exposing a silicon oxide wafer in a deposition chamber to nitrogen at a flow rate of at least about 240 standard liters per minute. It also includes a method for inhibiting the formation of a polysilicon seed in a furnace. The second patent focuses on the development of a stabilized titanium nitride control wafer. This method includes forming an initial TiN layer over a silicon oxide layer and treating it in an oxygen atmosphere to stabilize the TiN layer.
Career Highlights
Yen-Fei Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has contributed to advancements in semiconductor manufacturing processes, enhancing the efficiency and quality of products.
Collaborations
Yen-Fei Lin has collaborated with notable colleagues, including Yao-Hui Huang and Tung-Li Lee, who have contributed to his research and development efforts.
Conclusion
Yen-Fei Lin's innovative work in semiconductor technology has led to significant advancements in the field. His patents reflect a commitment to improving manufacturing processes and product quality in the semiconductor industry.