Omer, Israel

Yehiel Kapoano

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials Israel Limited. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yehiel Kapoano. Retrieved from https://idiyas.com/inventor/yehiel-kapoano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Yehiel Kapoano: Innovator in Multiple Mode Inspection Systems

Introduction

Yehiel Kapoano is a notable inventor based in Omer, Illinois. He has made significant contributions to the field of inspection systems, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of sample inspections.

Latest Patents

Kapoano holds a patent for a "System and method for multiple mode inspection of a sample." This invention includes a radiation source, an objective lens, a bright field detection module, a dark field detection module, and optics. The system is designed to operate in two modes, directing the input beam through different openings towards distinct regions of the objective lens. This innovative approach allows for versatile inspection capabilities without obstructing the input beam.

Career Highlights

Yehiel Kapoano is currently employed at Applied Materials Israel Limited, where he continues to develop and refine technologies related to inspection systems. His expertise in this area has positioned him as a valuable asset to his company and the industry at large.

Collaborations

Kapoano collaborates with Binyamin Kirshner, working together to advance their projects and share insights in their field. Their partnership exemplifies the importance of teamwork in driving innovation.

Conclusion

Yehiel Kapoano's contributions to the field of inspection systems through his patent demonstrate his commitment to innovation. His work at Applied Materials Israel Limited and collaboration with colleagues further highlight his role in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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