Hsinchu, Taiwan

Yee-Shian Henry Tong

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yee-Shian Henry Tong. Retrieved from https://idiyas.com/inventor/yee-shian-henry-tong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Innovations by Yee-Shian Henry Tong

Introduction

Yee-Shian Henry Tong is an accomplished inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of extreme ultraviolet lithography, particularly in optimizing plasma sources for advanced manufacturing processes.

Latest Patents

One of his notable patents is titled "Shock wave visualization for extreme ultraviolet plasma optimization." This innovative method involves monitoring a shock wave generated by plasma in an extreme ultraviolet light source. The process includes irradiating a target droplet with ionizing radiation to create a plasma and detect the resulting shock wave. Based on the detected shock wave, one or more operating parameters of the extreme ultraviolet light source can be adjusted, enhancing the efficiency of the lithography tool.

Career Highlights

Yee-Shian Henry Tong is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His work focuses on advancing technologies that are crucial for the production of cutting-edge microchips.

Collaborations

He collaborates with talented colleagues, including Yen-Shuo Su and Jhan-Hong Yeh, who contribute to the innovative environment at their workplace.

Conclusion

Yee-Shian Henry Tong's contributions to extreme ultraviolet lithography and his innovative patent demonstrate his commitment to advancing technology in the semiconductor industry. His work continues to influence the future of manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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