Hwaseong-si, South Korea

Yechan Kim

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yechan Kim. Retrieved from https://idiyas.com/inventor/yechan-kim-p7n9i0v0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 8.0


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Yechan Kim: Innovator in Integrated Circuit Technology

Introduction

Yechan Kim is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of integrated circuit technology. His innovative work has led to the development of a unique brush polymer that enhances photoresist compositions.

Latest Patents

Yechan Kim holds a patent for a "Brush polymer, photoresist composition including the same, and method of manufacturing integrated circuit device." This invention features a brush polymer that includes a core and multiple side polymer chains. These side polymer chains are bonded to the core and extend outward, forming either a bottle-brush or star-brush polymer. Each side polymer chain consists of a first repeating unit and a second repeating unit, which are crucial for the functionality of the photoresist composition.

Career Highlights

Yechan Kim is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His work at Samsung has allowed him to focus on advancing integrated circuit manufacturing processes. With a patent portfolio that includes 1 patent, he continues to push the boundaries of innovation in his field.

Collaborations

Yechan collaborates with talented coworkers, including JinJoo Kim and Sumin Kim. Their combined expertise fosters a creative environment that drives technological advancements.

Conclusion

Yechan Kim's contributions to integrated circuit technology exemplify the spirit of innovation. His patented brush polymer represents a significant advancement in photoresist compositions, showcasing his commitment to enhancing manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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