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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12761560 B1

PDFFull Text
Date of Patent:
Oct. 13, 2026

Filed:

May. 27, 2022

Polymers for photoresist and photoresist compositions including the same

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Juhyeon Park, Hwaseong-si, KR;

Hyunwoo Kim, Seongnam-si, KR;

Suk Koo Hong, Suwon-si, KR;

Su Min Kim, Suwon-si, KR;

Yechan Kim, Hwaseong-si, KR;

Jicheol Park, Anyang-si, KR;

Honggu Im, Hwaseong-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Attorney:

Wolf, Greenfield & Sacks, P.C.

Primary Examiner:

Mark F Huff

Assistant Examiner:

Anna undefined Malloy

Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08F 214/18 (2006.01); C08F 220/18 (2006.01); C08F 220/30 (2006.01); C08F 226/02 (2006.01); C08F 228/02 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C08F 214/18 (2013.01); C08F 220/1806 (2020.02); C08F 220/301 (2020.02); C08F 226/02 (2013.01); C08F 228/02 (2013.01); G03F 7/0045 (2013.01);
Abstract

A polymer for photoresist and a photoresist composition including the polymer. The polymer for photoresist may include a polymerization unit comprising a sensitizer, and a protection group. The polymerization unit may include a structure of chemical formula 1: wherein R1 is hydrogen, a halogen element, a methyl group, a trifluoromethyl group, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, or a substituted or unsubstituted arylalkyl group having 6 to 18 carbon atoms, and n is an integer of 1 to 100,000.

Find Patent Forward Citations

Park, Juhyeon. (2026). Polymers for photoresist and photoresist compositions including the same (U.S. Patent No. 12761560). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12761560

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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