Company Filing History:
Years Active: 2025
Title: Honggu Im - Innovator in Photoresist Compositions
Introduction
Honggu Im is an inventor based in Suwon-si, South Korea. He is known for his work in the field of photoresist compositions and their applications in manufacturing integrated circuit devices. Although he currently holds no granted patents, his contributions to the field are noteworthy.
Latest Patent Applications
Honggu Im has submitted several patent applications related to photoresist compositions. One of his latest applications is titled "PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES BY USING THE SAME." This application describes photoresist compositions that include a photosensitive polymer and a solvent. The photosensitive polymer comprises a pyridinium salt and a functional group that can be converted to a radical. This functional group is capable of generating a radical through the decomposition of a bond with the pyridinium salt.
Another significant application is "PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME." This application details a photoresist composition that includes an organometallic compound with a central metal and at least one organic ligand. The organic ligand features an ylide group that is coordinately bonded to the central metal, showcasing innovative approaches in the field.
Conclusion
Honggu Im's work in photoresist compositions highlights his innovative spirit and dedication to advancing technology in integrated circuit manufacturing. His latest patent applications reflect his commitment to developing new methods and materials in this critical area of research.