Company Filing History:
Years Active: 2025
Title: Jicheol Park - Innovator in Photoresist Compositions
Introduction
Jicheol Park is an inventor based in Suwon-si, South Korea. He is known for his contributions to the field of photoresist compositions, which are essential in the manufacturing of integrated circuit devices. Although he currently holds no granted patents, his innovative work in this area is noteworthy.
Latest Patent Applications
Jicheol Park has filed several significant patent applications. One of his latest applications is titled "PHOTORESIST COMPOSITIONS INCLUDING A SULFONATE GROUP AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME." This application describes photoresist compositions that may include a photosensitive polymer, a photoacid generator (PAG), and a solvent. The photosensitive polymer contains a sulfonate group (—SOO—) bonded with an α-trifluoromethylbenzyl group. Another application is for a "PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME." This application provides a photoresist composition that includes a chemically amplified polymer, a photoacid generator, and a photo-decomposable quencher. The quencher includes a pyridinium-based material that generates a neutral material upon exposure and acts as a base to neutralize an acid before exposure.
Conclusion
Jicheol Park's work in photoresist compositions demonstrates his innovative approach to integrated circuit manufacturing. His latest patent applications reflect his commitment to advancing technology in this field.