Kamakura, Japan

Yayori Toriu

This inventor holds 1 USPTO granted patent. Top assignee: Toshiba Memory Corporation. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yayori Toriu. Retrieved from https://idiyas.com/inventor/yayori-toriu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Yayori Toriu: Innovator in Mask Pattern Verification

Introduction

Yayori Toriu is a notable inventor based in Kamakura, Japan. He has made significant contributions to the field of technology, particularly in the area of mask pattern verification. His innovative approach has led to the development of a unique method that enhances the accuracy of pattern verification processes.

Latest Patents

Yayori Toriu holds a patent for a "Mask pattern verification method." This method involves several steps, including calculating mask pattern data, generating optical and resist images, and utilizing multiple algorithms to compare feature amounts against predetermined thresholds. The process allows for the detection of critical points in patterns, thereby improving the reliability of mask pattern verification.

Career Highlights

Toriu is currently employed at Toshiba Memory Corporation, where he applies his expertise in technology and innovation. His work at Toshiba has positioned him as a key player in advancing the company's technological capabilities.

Collaborations

Throughout his career, Yayori Toriu has collaborated with esteemed colleagues such as Masanari Kajiwara and Fumiharu Nakajima. These collaborations have fostered a productive environment for innovation and have contributed to the success of their projects.

Conclusion

Yayori Toriu's contributions to mask pattern verification exemplify his commitment to innovation in technology. His work continues to influence the industry and showcases the importance of collaboration in achieving groundbreaking advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…