The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2020
Filed:
Aug. 09, 2018
Toshiba Memory Corporation, Minato-ku, Tokyo, JP;
Yayori Toriu, Kamakura Kanagawa, JP;
Masanari Kajiwara, Yokohama Kanagawa, JP;
Fumiharu Nakajima, Yokohama Kanagawa, JP;
TOSHIBA MEMORY CORPORATION, Tokyo, JP;
Abstract
According to one embodiment, a mask pattern verification method includes: calculating mask pattern data; calculating an optical image and a resist image; calculating a first feature amount and a second feature amount, using a plurality of algorithms; in each of the plurality of algorithms, comparing the first feature amount with a first threshold, and detecting a critical point candidate in a first pattern; in each of the plurality of algorithms, comparing the second feature amount with a second threshold, and detecting a critical point in the first pattern; and selecting at least one of the plurality of algorithms, and displaying a detection result of the critical point corresponding to a selected algorithm.