Chiba, Japan

Yawara Nojima

This inventor holds 2 USPTO granted patents. Top assignee: Nikon Corporation. Active years: 1993-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yawara Nojima. Retrieved from https://idiyas.com/inventor/yawara-nojima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 2

Forward Citations = 54(Granted Patents)


Location History:

  • Chiba, JP (1993)
  • Narashino, JP (1999)

Company Filing History:


Years Active: 1993-1999

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2 patents (USPTO):Explore Patents

Title: Yawara Nojima: Innovator in Exposure Apparatus Technology

Introduction

Yawara Nojima is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of optical technology, particularly in the development of exposure apparatuses. With a total of 2 patents, Nojima's work has advanced the precision and efficiency of imaging systems used in various applications.

Latest Patents

Nojima's latest patents include an innovative exposure apparatus and a projection exposure apparatus. The exposure apparatus is designed to illuminate a mask with exposure light emitted from an illumination optical system. It projects a mask pattern image onto a photosensitive substrate, enhancing exposure accuracy. The illumination optical system features an optical element that ensures uniform intensity distribution of the exposure light. Additionally, it includes an adjusting mechanism that maintains a constant positional relationship between the optical element and aperture stops, thereby improving exposure accuracy.

The projection exposure apparatus comprises a projection optical system that forms an image of a predetermined pattern on a mask onto a photosensitive substrate. This system utilizes exposure light of a specific wavelength and includes an illumination system that aligns the mask with light of a different wavelength. The apparatus is equipped with a detection system to detect light reflected by the mark, ensuring precise alignment and exposure.

Career Highlights

Yawara Nojima is currently employed at Nikon Corporation, a leading company in imaging and optical products. His work at Nikon has allowed him to focus on cutting-edge technologies that enhance imaging systems. His contributions have been instrumental in advancing the capabilities of exposure apparatuses.

Collaborations

Nojima has collaborated with notable coworkers, including Masahiro Nakagawa and Hideo Mizutani. Their combined expertise has fostered innovation and development in the field of optical technology.

Conclusion

Yawara Nojima's contributions to exposure apparatus technology have significantly impacted the field of optical imaging. His innovative patents and work at Nikon Corporation highlight his role as a key inventor in this domain.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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