The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 1999
Filed:
May. 29, 1997
Yawara Nojima, Narashino, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus illuminates a mask with exposure light emitted from an illumination optical system and projects a mask pattern image that is formed when the exposure light passes through the mask onto a photosensitive substrate. The illumination optical system includes an optical element for making the intensity distribution of exposure light emitted from the light source uniform, and aperture stops are interchangeably positioned directly behind the optical element. The illumination optical system additionally includes an adjusting mechanism that adjusts the positions and the inclination of the optical element and the aperture stops in the direction along the optical axis in directions perpendicular to the optical axis, and with respect to the inclination from the optical axis. Thus, the positional relationship between the optical element and the aperture stops can be kept constant, and as a result, the exposure accuracy of an exposure apparatus can be improved.