Yasuyuki Masumoto

Title: The Innovations of Yasuyuki Masumoto

Yasuyuki Masumoto is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work has been instrumental in advancing the capabilities of semiconductor devices, modules, and packaged devices.

Latest Patents

Masumoto's latest patents focus on semiconductor devices that include a semiconductor substrate with a first conductivity-type impurity. These devices feature a low-concentration impurity layer, a backside electrode made of metal material, and first and second transistors within the low-concentration impurity layer. The design allows for the first transistor to have a source electrode and gate electrode on the surface of the low-concentration impurity layer, while the second transistor is similarly configured. The semiconductor substrate serves as a common drain region for both transistors. Notably, the thickness of the backside electrode ranges from 25 to 35 micrometers, with a specific ratio to the thickness of the semiconductor layer.

Career Highlights

Throughout his career, Yasuyuki Masumoto has worked with prominent companies such as Matsushita Electric Industrial Co., Ltd. and Nuvoton Technology Corporation Japan. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Masumoto has collaborated with notable colleagues, including Eiji Yasuda and Kenichi Hidaka. These partnerships have likely enhanced his work and contributed to the development of his patented technologies.

Conclusion

Yasuyuki Masumoto's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry and pave the way for future innovations.