Company Filing History:
Years Active: 2018
Title: **Innovations of Yasuyuki Ido in Substrate Liquid Processing**
Introduction
Yasuyuki Ido is an accomplished inventor based in Yamanashi, Japan, known for his significant contribution to the field of substrate liquid processing. With expertise in developing advanced technologies, he has secured one patent that enhances the efficacy of liquid processing on substrates, making strides in manufacturing and technology applications.
Latest Patents
His notable patent is titled "Substrate liquid processing apparatus having nozzle with multiple flow paths and substrate liquid processing method thereof." This innovative apparatus includes a processing unit, a nozzle, a silylation liquid supply mechanism, and a blocking fluid supply mechanism. The processing unit is designed to perform water repellency imparting processing on substrates by efficiently supplying a silylation liquid. The nozzle plays a crucial role by containing an ejection port that disperses the silylation liquid to the substrate, thereby improving process performance.
Career Highlights
Yasuyuki Ido works at Tokyo Electron Limited, a globally recognized leader in semiconductor manufacturing equipment. His work there focuses on pioneering technologies that facilitate the processing of semiconductor substrates, contributing to the advancement of the tech industry. Over the years, he has developed crucial methods and apparatuses that enhance manufacturing efficiency and product quality in the semiconductor domain.
Collaborations
Ido collaborates with talented colleagues such as Naoki Shindo and Takehiko Orii. Together, they engage in innovative research and development projects, driving further advancements in substrate processing technologies. Their collective efforts demonstrate the power of teamwork in fostering inventions that can shape the future of semiconductor manufacturing.
Conclusion
Yasuyuki Ido's contributions to the world of substrate liquid processing illustrate the impact of dedicated innovation. His patent represents a significant breakthrough in technology that supports the effective processing of substrates within the semiconductor industry. As he continues to work alongside esteemed colleagues at Tokyo Electron Limited, the potential for future inventions remains promising.