Location History:
- Osaka, JP (1991)
- Kadoma, JP (1987 - 1992)
- Neyagawa, JP (1996 - 2009)
Company Filing History:
Years Active: 1987-2009
Title: Innovations by Yasushi Sawada in Plasma Technology
Introduction
Yasushi Sawada, an innovative inventor based in Neyagawa, Japan, has made significant contributions to the field of plasma technology, holding a total of 10 patents. His work focuses on improving plasma treatment apparatuses and methods, which are essential in various industrial applications.
Latest Patents
Among his latest patents is a groundbreaking plasma processing apparatus that enhances treatment area and uniformity. This apparatus features a pair of electrode plates with multiple through holes, separated by an insulating plate, also perforated. The design facilitates the formation of numerous discharge spaces, which enable simultaneous plasma generation when a voltage is applied, thus allowing efficient and uniform treatment over large areas. Another notable patent encompasses a high-speed plasma treatment method using a tubular vessel, which is structured to promote uniform treatment of objects with plasma. This system includes a gas supply and a power source to produce streamers of gas, ensuring effective plasma distribution.
Career Highlights
Yasushi Sawada has a rich career, having worked for Matsushita Electric Works, Ltd., where he honed his expertise in plasma technology and contributed to the development of advanced plasma treatment solutions. His dedication to innovation and improvement has marked him as a notable figure in his field.
Collaborations
Throughout his career, Sawada has collaborated with esteemed colleagues such as Keiichi Yamazaki and Noriyuki Taguchi, further fostering advancements in plasma technology. Their combined efforts have led to groundbreaking solutions in efficient plasma processing methodologies.
Conclusion
Yasushi Sawada's innovative work in plasma technology exemplifies the impact of dedicated inventors on industry advancements. With a total of 10 patents to his name, his contributions continue to shape the future of plasma processing, leading to enhanced uniformity and efficiency in treatments across multiple applications.