The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2002
Filed:
Jul. 27, 2000
Kosuke Nakamura, Neyagawa, JP;
Yasushi Sawada, Neyagawa, JP;
Hiroaki Kitamura, Moriguchi, JP;
Yoshitami Inoue, Neyagawa, JP;
Matsushita Electric Works, Ltd., Kadoma, JP;
Abstract
A plasma treatment apparatus includes two or more pairs of electrodes for plasma generation, a treatment chamber for accommodating the electrodes, gas supply unit for supplying a plasma-generation gas such as rare gas into the chamber, and a power supply. A pulse-like or AC voltage is applied between the electrodes to generate dielectric barrier discharge plasma of the gas in the vicinity of atmospheric pressure, so that an object placed between the electrodes is treated by the plasma. At least one of the electrodes is provided with a tubular electrode substrate and a protection layer formed by heat-fusion coating a glass-based material on at least an outer surface exposed to plasma of the tubular electrode substrate.