Ayase, Japan

Yasushi Obara

This inventor holds 1 USPTO granted patent. Top assignee: Speedfam Co Ltd. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasushi Obara. Retrieved from https://idiyas.com/inventor/yasushi-obara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Yasushi Obara: Innovator in Local Dry Etching Technology

Introduction

Yasushi Obara is a notable inventor based in Ayase, Japan. He has made significant contributions to the field of etching technology, particularly with his innovative designs that enhance manufacturing processes.

Latest Patents

Yasushi Obara holds a patent for a local dry etching apparatus. This apparatus features a vacuum chamber that maintains a predetermined degree of vacuum, a nozzle with both a first and second end, and a discharge tube connected to a plasma generator. The design also includes an electromagnetic wave irradiation part that oscillates electromagnetic waves, which are introduced to the plasma generator, along with a spacer positioned between the nozzle and the discharge tube. This invention is crucial for improving the efficiency and precision of etching processes.

Career Highlights

Yasushi Obara is currently associated with Speedfam Co Ltd, where he applies his expertise in etching technology. His work at the company has been instrumental in advancing the capabilities of their manufacturing processes.

Conclusion

Yasushi Obara's contributions to the field of local dry etching technology exemplify his innovative spirit and dedication to enhancing industrial processes. His patent reflects a significant advancement in the technology, showcasing his role as a key inventor in this domain.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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