Yasuo Ohgoshi

Title: Innovations of Yasuo Ohgoshi

Introduction

Yasuo Ohgoshi is a prominent inventor based in Kudamatsu, Japan. He has made significant contributions to the field of plasma processing, holding a total of 12 patents. His work focuses on enhancing the efficiency and precision of plasma processing apparatuses and methods.

Latest Patents

Among his latest innovations are two notable patents related to plasma processing apparatuses and methods. The first patent describes a plasma processing apparatus that includes a first radio-frequency power supply for generating plasma in a vacuum chamber, a second radio-frequency power supply for a sample stage, and a matching box that samples information for performing matching during a specific effective period. This invention maintains a matching state attained during the sampling effective period, ensuring optimal performance. The second patent presents a plasma processing apparatus that features a time-modulated radio frequency power supply, which allows for high-precision control. This apparatus includes a vacuum chamber, a sample holder, and a second radio frequency power supply, with parameters that can be controlled across multiple ranges.

Career Highlights

Yasuo Ohgoshi has worked with notable companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His experience in these organizations has contributed to his expertise in plasma processing technologies.

Collaborations

Some of his notable coworkers include Michikazu Morimoto and Tetsuo Ono, who have collaborated with him on various projects in the field of plasma processing.

Conclusion

Yasuo Ohgoshi's contributions to plasma processing technology through his patents and collaborations highlight his innovative spirit and dedication to advancing this field. His work continues to influence the development of efficient plasma processing methods and apparatuses.