Takasago, Japan

Yasuo Nakane

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.). Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuo Nakane. Retrieved from https://idiyas.com/inventor/yasuo-nakane

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Yasuo Nakane: Inventor in Arc Ion Plating Technology.

Introduction

Yasuo Nakane is an inventor associated with Takasago, Japan, and Kobe Steel, Ltd. His work includes a patent for a target used in cathode-discharge arc ion plating.

Latest Patents

Nakane is credited with one patent: “Target for Cathode Discharging Arc Ion Plating and Method of Manufacturing the Same.” The invention describes an aluminum-and-chromium target designed to support the formation of high-quality hard films. It limits the thickness of the aluminum-chromium compound layer to 30 micrometers or less, or limits the compound’s X-ray diffraction peak intensity to 10 percent or less of the combined peak intensities of aluminum, chromium, and the compound. The target also has a relative density of at least 92 percent. These features are intended to reduce uneven arc-spot movement and suppress the formation of macroparticles.

Career Highlights

Nakane’s listed patent work is associated with Kobe Steel, Ltd. The invention addresses target composition and manufacturing characteristics for arc ion plating applications.

Collaborations

Toshiki Sato and Yoichiro Yoneda are identified as Nakane’s coworkers.

Conclusion

Yasuo Nakane’s patent focuses on improving arc ion plating targets to help produce high-quality hard films while reducing process irregularities and macroparticle formation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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