The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Mar. 26, 2003
Kenji Yamamoto, Kobe, JP;
Toshiki Sato, Kobe, JP;
Yasuo Nakane, Takasago, JP;
Hidekazu Morimoto, Takasago, JP;
Yoichiro Yoneda, Takasago, JP;
Kenji Yamamoto, Kobe, JP;
Toshiki Sato, Kobe, JP;
Yasuo Nakane, Takasago, JP;
Hidekazu Morimoto, Takasago, JP;
Yoichiro Yoneda, Takasago, JP;
Abstract
In a target for cathode discharging arc ion plating containing Al and Cr as an essential ingredient according to the invention, the thickness of the Al and Cr compound layer formed between Cr particles and Al contained in a target is 30 μm or less. Alternatively, the total for the peak intensities of Al—Cr compound observed between diffraction angles between 10 to 80° by X-ray diffractiometry according to θ=2θ method is 10% or less relative to the total for the peak intensities of Al, Cr and the Al—Cr compound. Further, the relative density of the target is 92% or more. The target is capable of forming hard films of high quality while preventing not uniform movement of arc spots and suppressing formation of macro particles.