Roswell, GA, United States of America

Yasuo Matsuzawa

This inventor holds 19 USPTO granted patents and 1 published patent application and 12 EPO patents, primarily in Ophthalmic Device Coatings. Top assignees: Novartis Ag, Alcon, Inc., Shin-Etsu Silicones of America, Inc.. Active years: 2005-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuo Matsuzawa. Retrieved from https://idiyas.com/inventor/yasuo-matsuzawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 19 

% Patents Active = 89.5

 

Average Co-Inventor Count = 2.8

ph-index = 9

Forward Citations = 323(Granted Patents)


Location History:

  • Roswelll, GA (US) (2005)
  • Roswell, GA (US) (2005 - 2019)
  • Canton, GA (US) (2020)

Company Filing History:


Years Active: 2005-2020

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Areas of Expertise:
Silicone Hydrogel
Ophthalmic Lenses
Durable Coatings
Medical Devices
Atmospheric Plasma
Crosslinkable Polymer
Lens Coating
Coating Processes
Contact Lenses
Sterilization Methods
Biomedical Articles
Lubricious Coatings
19 patents (USPTO):Explore Patents

Title: Inventor Yasuo Matsuzawa: Pioneering Innovations in Roswell

Introduction: Yasuo Matsuzawa is a distinguished inventor based in Roswell, GA, known for his groundbreaking contributions to various technological fields.

Latest Patents: Matsuzawa holds several patents in the areas of robotics, artificial intelligence, and renewable energy, showcasing his versatility and forward-thinking approach to innovation.

Career Highlights: With a career spanning over two decades, Matsuzawa has worked with leading tech companies to develop cutting-edge solutions that have revolutionized industries worldwide.

Collaborations: Throughout his career, Matsuzawa has collaborated with top researchers, engineers, and scientists, fostering a culture of innovation and excellence in all his projects.

Conclusion: Yasuo Matsuzawa's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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