Machida, Japan

Yasuo Kato

This inventor holds 2 USPTO granted patents. Top assignee: Canon Anelva Corporation. Active years: 2022-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuo Kato. Retrieved from https://idiyas.com/inventor/yasuo-kato-n2an5kxe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022-2023

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2 patents (USPTO):Explore Patents

Title: Innovations of Yasuo Kato

Introduction

Yasuo Kato is a notable inventor based in Machida, Japan. He has made significant contributions to the field of substrate processing technology. With a total of two patents to his name, Kato's work has had a considerable impact on the industry.

Latest Patents

Kato's latest patents include a substrate processing apparatus and a substrate processing method. This innovative apparatus processes a substrate using particles and features a conveyance mechanism designed to transport the substrate along a conveyance surface. Additionally, it includes a particle source that emits particles, a rotation mechanism that allows the particle source to pivot about a rotation axis, and a movement mechanism that adjusts the distance between the particle source and the conveyance surface.

Career Highlights

Yasuo Kato is currently employed at Canon Anelva Corporation, where he continues to develop cutting-edge technologies. His work at Canon Anelva has positioned him as a key player in the advancement of substrate processing methods.

Collaborations

Kato collaborates with talented coworkers such as Yuji Takanami and Kento Norota. Their combined expertise contributes to the innovative projects at Canon Anelva Corporation.

Conclusion

Yasuo Kato's contributions to substrate processing technology through his patents and work at Canon Anelva Corporation highlight his importance as an inventor in the field. His innovative approaches continue to shape the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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