The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2022
Filed:
Jul. 14, 2020
Applicant:
Canon Anelva Corporation, Kawasaki, JP;
Inventors:
Yuji Takanami, Tokyo, JP;
Kento Norota, Sagamihara, JP;
Naoyuki Okamoto, Sagamihara, JP;
Yasuo Kato, Machida, JP;
Yasushi Yasumatsu, Inagi, JP;
Assignee:
CANON ANELVA CORPORATION, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 14/46 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3435 (2013.01); C23C 14/3442 (2013.01); C23C 14/46 (2013.01); H01J 37/32733 (2013.01); H01J 2237/332 (2013.01);
Abstract
A substrate processing apparatus that processes a substrate using particles, includes a conveyance mechanism configured to convey the substrate along a conveyance surface, a particle source configured to emit particles, a rotation mechanism configured to make the particle source pivot about a rotation axis, and a movement mechanism configured to move the particle source such that a distance between the particle source and the conveyance surface is changed.