Tokushima, Japan

Yasunobu Hosokawa


 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 92(Granted Patents)


Location History:

  • Anan, JP (2010 - 2012)
  • Tokushima, JP (2021 - 2023)

Company Filing History:


Years Active: 2010-2023

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4 patents (USPTO):Explore Patents

Title: Yasunobu Hosokawa: Innovator in Semiconductor Manufacturing

Introduction

Yasunobu Hosokawa is a prominent inventor based in Tokushima, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of four patents. His innovative methods have advanced the technology used in creating semiconductor elements.

Latest Patents

Hosokawa's latest patents include a method for manufacturing semiconductor elements. This method involves providing a wafer with first and second regions at its upper surface, where the second region is positioned at the periphery of the first region and at a lower level. The process also includes forming a semiconductor layer made of a nitride semiconductor on the wafer's upper surface. Another notable patent describes a method of manufacturing semiconductor elements, which entails disposing a nitride semiconductor layer on a first wafer and bonding a second wafer to it. This method emphasizes the spatial relationship between the first region and the edges of the wafer, optimizing the manufacturing process.

Career Highlights

Yasunobu Hosokawa is associated with Nichia Corporation, a leading company in the semiconductor industry. His work has been instrumental in developing advanced manufacturing techniques that enhance the efficiency and performance of semiconductor devices.

Collaborations

Hosokawa has collaborated with notable colleagues, including Hisanori Tanaka and Yuuki Shibutani. Their combined expertise has contributed to the successful development of innovative semiconductor technologies.

Conclusion

Yasunobu Hosokawa's contributions to semiconductor manufacturing reflect his dedication to innovation and excellence in the field. His patents and collaborative efforts continue to influence the industry positively.

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