Tokyo, Japan

Yasumitsu Kawabata

This inventor holds 2 USPTO granted patents. Top assignees: Ebara Corporation, Kabushiki Kaisha Toshiba. Active years: 2013-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasumitsu Kawabata. Retrieved from https://idiyas.com/inventor/yasumitsu-kawabata

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2013-2017

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2 patents (USPTO):Explore Patents

Title: Yasumitsu Kawabata: Innovator in Substrate Polishing Technology

Introduction

Yasumitsu Kawabata is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate polishing technology, holding two patents that showcase his innovative approaches. His work has been instrumental in enhancing the efficiency and precision of polishing processes in various applications.

Latest Patents

Kawabata's latest patents include a polishing method and a substrate polishing apparatus. The polishing method involves a sophisticated process that includes rotating a polishing table, pressing a substrate against a polishing pad, and utilizing an eddy current film-thickness sensor to monitor and control the polishing process. This method ensures that the conductive film is polished to the desired thickness while preventing over-polishing.

The substrate polishing apparatus is designed to prevent excessive and insufficient polishing. It features a mechanism for polishing, a film thickness measuring device, an interface for entering target thickness, and a processing unit for calculating polishing time and rate. This apparatus also builds an additional polishing database to store data from past polishing results, enhancing its functionality and reliability.

Career Highlights

Throughout his career, Yasumitsu Kawabata has worked with prominent companies such as Ebara Corporation and Toshiba Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in substrate polishing technology.

Collaborations

Kawabata has collaborated with notable colleagues, including Hidetaka Nakao and Yoshifumi Katsumata. These collaborations have contributed to the advancement of polishing technologies and have fostered a spirit of innovation in their respective fields.

Conclusion

Yasumitsu Kawabata's contributions to substrate polishing technology through his patents and collaborations highlight his role as a significant innovator in the industry. His work continues to influence the efficiency and effectiveness of polishing processes, making a lasting impact on the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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