Chino, Japan

Yasuke Matsuzawa

This inventor holds 1 USPTO granted patent. Top assignee: Seiko Epson Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuke Matsuzawa. Retrieved from https://idiyas.com/inventor/yasuke-matsuzawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Yasuke Matsuzawa: Innovator in Semiconductor Manufacturing

Introduction

Yasuke Matsuzawa is a notable inventor based in Chino, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative approach has led to the development of a unique method that enhances the efficiency and effectiveness of semiconductor devices.

Latest Patents

Matsuzawa holds a patent for a "Method for manufacturing semiconductor device." This patent outlines a comprehensive process that includes forming a first through hole in a semiconductor substrate, applying insulating films, and utilizing resist for wet-etching. The method culminates in the formation of a second conductive film, showcasing his expertise in semiconductor technology. He has 1 patent to his name.

Career Highlights

Yasuke Matsuzawa is currently employed at Seiko Epson Corporation, a leading company in the technology sector. His work at Seiko Epson has allowed him to further develop his skills and contribute to groundbreaking advancements in semiconductor manufacturing.

Collaborations

Matsuzawa has collaborated with talented coworkers such as Koichi Mizugaki and Tomoyuki Kamakura. These collaborations have fostered an environment of innovation and creativity, leading to the successful development of new technologies.

Conclusion

Yasuke Matsuzawa is a prominent figure in the semiconductor industry, with a focus on innovative manufacturing methods. His contributions continue to shape the future of technology, making him a valuable asset to his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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