Kanagawa, Japan

Yasuhisa Sato


Average Co-Inventor Count = 2.3

ph-index = 13

Forward Citations = 494(Granted Patents)


Location History:

  • Kawasaki, JA (1978)
  • Yokohama, JP (1983 - 1984)
  • Isehara, JP (1991)
  • Kanagawa, JP (1982 - 1993)
  • Kawasaki, JP (1979 - 1998)

Company Filing History:


Years Active: 1978-1998

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45 patents (USPTO):Explore Patents

Title: The Innovative Mind of Yasuhisa Sato: A Pioneer in Surface Cleaning and Silicon Oxide Films

Introduction: Yasuhisa Sato is a prominent inventor based in Kanagawa, Japan, recognized for his significant contributions to technological advancements with a remarkable portfolio of 45 patents. His work primarily revolves around innovative dry cleaning processes and methods for forming silicon oxide films, showcasing his expertise in materials science and engineering.

Latest Patents: Sato’s latest patents include a groundbreaking dry cleaning process for cleaning surfaces, specifically targeting the removal of metal contaminants from oxide films without causing substantial etching. This method involves supplying a halide gas containing elements from groups IIIa, IVa, and Va, ensuring efficient cleaning. Another notable patent describes a method for forming a thin silicon oxide film with high dielectric breakdown by utilizing an oxidizing atmosphere in a precisely controlled chamber. This technique emphasizes maintaining a specific pressure and temperature while incorporating ozone gas generated from oxygen, highlighting Sato’s innovative approach to semiconductor manufacturing.

Career Highlights: Yasuhisa Sato has made significant strides in the tech industry through his tenure at prestigious companies like Canon and Fujitsu. His work at these leading organizations has not only advanced their technological frameworks but has also set new standards in the development of innovative products and processes.

Collaborations: During his career, Sato has collaborated with notable colleagues, including Yasuyuki Yamada and Hiroki Nakayama. These collaborations have likely fostered an environment of creativity and innovation, further enhancing the impact of their combined expertise in the field of technology.

Conclusion: Yasuhisa Sato exemplifies the spirit of innovation and dedication. His 45 patents reflect his commitment to advancing technology in dry cleaning and silicon oxide film formation. Through his impressive career and collaborations, he continues to influence the landscape of materials science and inspire future generations of inventors.

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