This inventor holds 1 USPTO granted patent. Top assignee: Jcu Corporation. Active years: 2016.
Company Filing History:
Years Active: 2016
Title: Yasuhiro Ogo: Innovator in Copper Plating Technology
Introduction
Yasuhiro Ogo is a notable inventor based in Hanoi, Vietnam. He has made significant contributions to the field of semiconductor technology through his innovative patent. His work focuses on enhancing copper plating techniques, which are crucial for the manufacturing of semiconductor devices.
Latest Patents
Yasuhiro Ogo holds a patent titled "Copper plating bath containing a tertiary amine compound and use thereof." This patent provides a copper plating technique that enables the filling of high aspect-ratio via-holes and through-holes in semiconductor substrates, such as silicon, organic material, or ceramic substrates. The technique involves a tertiary amine compound, which is synthesized by reacting a heterocyclic compound with the epoxy group of a glycidyl ether group from a compound that has three or more glycidyl ether groups. Additionally, it includes a quaternary amine compound and a copper plating additive, along with a copper plating bath and method employing these compounds.
Career Highlights
Yasuhiro Ogo is associated with JCU Corporation, where he applies his expertise in copper plating technology. His innovative approach has led to advancements in the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Yasuhiro collaborates with talented individuals in his field, including coworkers Yuto Oyama and Yu Tonooka. Their combined efforts contribute to the ongoing development of cutting-edge technologies in semiconductor applications.
Conclusion
Yasuhiro Ogo's contributions to copper plating technology exemplify the importance of innovation in the semiconductor industry. His patent reflects a significant advancement that can enhance manufacturing processes and improve the performance of semiconductor devices.