Osaka, Japan

Yasuhiro Koyama

This inventor holds 2 USPTO granted patents. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 1999-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuhiro Koyama. Retrieved from https://idiyas.com/inventor/yasuhiro-koyama-wdiiyklu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 22(Granted Patents)


Location History:

  • Yamatokooriyama, JP (1999)
  • Osaka, JP (2015)

Company Filing History:


Years Active: 1999-2015

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2 patents (USPTO):Explore Patents

Title: Yasuhiro Koyama: Innovator in Semiconductor Technology

Introduction

Yasuhiro Koyama is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods for enhancing the performance and manufacturing processes of electronic components.

Latest Patents

Koyama's latest patents include a "Mounting method for semiconductor light emitter using resist with openings of different sizes." This invention outlines a method for mounting an LED chip on a ceramic substrate, ensuring that the upper surface of the positive electrode is positioned higher than that of the negative electrode. The process involves laminating resist on both electrodes, forming openings, creating bumps in the openings, and bonding these bumps to the ceramic substrate. The design ensures that the cross-sectional area of one opening is larger than that of the other, optimizing the mounting process.

Another notable patent is the "Method for manufacturing non-volatile memory." This method describes the formation of a non-volatile memory with a floating gate electrode. The floating gate is created by alternating layers of polysilicon and tungsten silicide on a silicon substrate, with a tunnel oxide layer in between. The tungsten silicide layer is formed using a CVD technique that reduces WF.sub.6 gas with SiH.sub.2 Cl.sub.2 gas, showcasing Koyama's innovative approach to memory technology.

Career Highlights

Yasuhiro Koyama is currently associated with Sharp Kabushiki Kaisha Corporation, where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise and innovative mindset have positioned him as a key player in advancing electronic component manufacturing.

Collaborations

Koyama has collaborated with notable colleagues, including Katsuji Kawakami and Keiichi Sawai. Their combined efforts contribute to the ongoing advancements in semiconductor technology.

Conclusion

Yasuhiro Koyama's contributions to semiconductor technology through his patents and work at Sharp Kabushiki Kaisha Corporation highlight his role as an influential inventor. His innovative methods are paving the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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