Utsunomiya, Japan

Yasuhiro Kishikawa

This inventor holds 9 USPTO granted patents and 1 published patent application. Top assignee: Canon Kabushiki Kaisha. Active years: 2006-2015.

USPTO Granted Patents = 9 

% Patents Active = 11.1

Average Co-Inventor Count = 1.9

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Tochogi, JP (2006 - 2007)
  • Tochigi, JP (2007)
  • Utsunomiya, JP (2006 - 2015)

Company Filing History:


Years Active: 2006-2015

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9 patents (USPTO):Explore Patents

Title: Yasuhiro Kishikawa: Innovator in Exposure Apparatus Technology

Introduction

Yasuhiro Kishikawa is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of exposure apparatus technology, holding a total of 9 patents. His work has been instrumental in advancing methods for manufacturing devices that utilize intricate optical systems.

Latest Patents

Kishikawa's latest patents include an innovative exposure apparatus and a device manufacturing method that employs a phase-modulation diffraction grating to create an interference pattern. This exposure apparatus is designed to expose a substrate coated with photoresist, forming a latent image on the photoresist. It features an original holding unit that holds the phase-modulation diffraction grating, allowing a light beam to diffract and form an interference pattern on the substrate's surface. Additionally, he has developed another exposure apparatus that incorporates an illumination optical system, a projection optical system, and a measuring unit for assessing the refractive index of the liquid used in the exposure process.

Career Highlights

Kishikawa is associated with Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to push the boundaries of exposure technology, contributing to the company's reputation for innovation in the field.

Collaborations

Throughout his career, Kishikawa has collaborated with notable colleagues, including Seiji Takeuchi and Tokuyuki Honda. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in exposure apparatuses.

Conclusion

Yasuhiro Kishikawa's contributions to exposure apparatus technology exemplify his innovative spirit and dedication to advancing the field. His patents and collaborations continue to influence the industry, showcasing the importance of creativity and teamwork in technological advancements.

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