Canon Kabushiki Kaisha

Yasuhiro Kishikawa

Seiji Takeuchi

Tokuyuki Honda

An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a phase-modulation diffraction grating so that an interference pattern is formed on a surface of the substrate by a light beam diffracted by the original, a substrate holding unit configured to hold the substrate, and a light beam dividing optical system configured to divide a light beam to form a plurality of light beams which enter the original, wherein a latent image is formed on the substrate by superposition of a plurality of interference patterns formed on the surface of the substrate, the plurality of interference patterns respectively corresponding to the plurality of light beams which enter the original.

Exposure apparatus and device manufacturing method using original with phase-modulation diffraction grating to form interference pattern

An exposure apparatus includes an illumination optical system for illuminating a reticle with exposure light, a projection optical system for projecting a pattern of the reticle onto a plate via a liquid supplied to a space between the projection optical system and the plate, a supply pipe for supplying the liquid to the space, a recovery pipe for recovering the liquid from the space, and a measuring unit for measuring a refractive index of the liquid. The measuring unit includes (i) a light source for generating a measurement light having the same wavelength as that of the exposure light, (ii) a liquid reservoir for storing the liquid, the liquid reservoir being disposed apart from the space via the supply pipe or the recovery pipe, and having a transmitting surface for transmitting the measurement light and a reflecting surface for reflecting the measurement light transmitted by the transmitting surface and the liquid in the reservoir, and (iii) a detector for detecting the measurement light reflected on the reflecting surface and transmitted by the liquid in the liquid reservoir and the transmitting surface.

Exposure apparatus

Disclosed is a birefringence measuring apparatus and method for measuring birefringence of a sample in a reduced time and in a simple manner. The birefringence measuring apparatus includes a light projecting unit for projecting approximately circularly polarized light upon a sample, a Stokes meter for detecting a state of polarization of light from the sample, and a calculating system for calculating birefringence of the sample on the basis of a Stokes parameter from the Stokes meter.

Method and apparatus for measuring birefringence

A birefringence measurement apparatus for calculating information of polarization of light emitted from an object to be measured includes a light source, a first polarization element for extracting a beam in a specific polarization direction from light emitted from the light source, a sample stage that holds an object to be measured, at least one beam splitting unit that splits the light emitted from the object into two beams having the same polarization as that of the light emitted from the object, at least two second polarization elements for extracting beams in a specific polarization direction of the light split by the beam splitting unit, at least two light-quantity detectors for detecting light quantity of beams that have transmitted through the second polarization element, and an operation part for operating a light quantity received by the light-quantity detectors.

Birefringence measurement apparatus, strain remover, polarimeter and exposure apparatus

A polarization state detecting system includes a first dividing device for dividing incident light into two light beams having the same polarization state as that of the incident light, a detector for detecting one of the two light beams from the first dividing device, through a polarizer, and an acquisition device for acquiring information regarding the polarization state of the incident light on the basis of an output of the detector. The first dividing device includes a first element, a second element and a third element. The second element is disposed so that a p-polarization component reflected by the first element is reflected by the second element as an s-polarization component. The third element is disposed so that a p-polarization component transmitted through the first element is reflected by the third element as an s-polarization component, and one of the two light beams is light reflected by the first element and reflected by the second element, while the other of the two light beams is light transmitted through the first element and transmitted through the third element.

Polarization state detecting system, light source, and exposure apparatus

A beam splitting apparatus generates, from incident light having a specific polarization, first and second split light that has the specific polarization.

Beam splitting apparatus, transmittance measurement apparatus, and exposure apparatus

A polarization state detecting system includes a first dividing device for dividing incident light into two light beams having the same polarization state as the incident light, a detector for detecting one of the two light beams from the first dividing device, through a polarizer, and an acquisition device for acquiring information regarding the polarization state of the incident light on the basis of an output of the detector. The first dividing device includes a first element, a second element and a third element. The second element is disposed so that a p-polarization component reflected by the first element is reflected by the second element as an s-polarization component. The third element is disposed so that a p-polarization component transmitted through the first element is reflected by the third element as an s-polarization component, and one of the two light beams is light reflected by the first element and reflected by the second element, while the other of the two light beams is light transmitted through the first element and transmitted through the third element.

Growing community of inventors

Utsunomiya, Japan

Yasuhiro Kishikawa