This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Yashushi Takakura: Innovator in Plasma Technology
Introduction
Yashushi Takakura is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of semiconductor processing through his innovative work in plasma generation and control.
Latest Patents
Takakura holds a patent for a method and apparatus for generating and controlling plasma in a semiconductor substrate processing chamber using a dual frequency RF source. This patent, titled "Plasma generation and control using a dual frequency RF source," outlines a process that involves supplying a first RF signal to an electrode within the processing chamber at a first frequency, and a second RF signal at a different frequency. The unique aspect of this invention is that the second frequency differs from the first by a desired amount, allowing for effective plasma modulation.
Career Highlights
Yashushi Takakura is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on advancing technologies that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Some of his notable coworkers include Steven C. Shannon and Alex Paterson, who contribute to the innovative environment at Applied Materials, Inc.
Conclusion
Yashushi Takakura's contributions to plasma technology exemplify the importance of innovation in the semiconductor industry. His patent reflects a significant advancement in the field, showcasing his expertise and commitment to technological progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile